- 专利标题: EVAPORATION COMPENSATION IN A FLUIDIC DEVICE
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申请号: US17607309申请日: 2019-07-31
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公开(公告)号: US20220203349A1公开(公告)日: 2022-06-30
- 发明人: Jeffrey A. NIELSEN , Roberto A. PUGLIESE
- 申请人: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
- 申请人地址: US TX Spring
- 专利权人: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
- 当前专利权人: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
- 当前专利权人地址: US TX Spring
- 国际申请: PCT/US2019/044333 WO 20190731
- 主分类号: B01L3/02
- IPC分类号: B01L3/02 ; B01L3/00 ; G01N35/10
摘要:
Aspects of the present disclosure relate to evaporation compensation in fluidic devices. An example apparatus for evaporation compensation includes an assessment circuit to determine an amount of evaporation of a volume dispensed in a microwell of a fluidic device. The amount of evaporation may be determined based on the volume in the microwell, and an amount of time after dispensing the volume in the microwell. A compensation circuit may determine, based on the amount of evaporation, a compensation factor for the microwell including an amount of a normalizing fluid to compensate for the amount of evaporation. The compensation circuit may also create a normalization profile for the fluidic device, including an association between the fluidic device and the compensation factor. A dispensing circuit may dispense the normalizing fluid in the microwell according to the normalization profile.
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