Invention Application
- Patent Title: INTERFEROMETER SYSTEM, METHOD OF DETERMINING A MODE HOP OF A LASER SOURCE OF AN INTERFEROMETER SYSTEM, METHOD OF DETERMINING A POSITION OF A MOVABLE OBJECT, AND LITHOGRAPHIC APPARATUS
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Application No.: US17613124Application Date: 2020-05-11
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Publication No.: US20220205775A1Publication Date: 2022-06-30
- Inventor: Maarten Jozef JANSEN , Manoj Kumar MRIDHA , Engelbertus Antonius Fransiscus VAN DER PASCH
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP19179357.9 20190611,EP19189097.9 20190730
- International Application: PCT/EP2020/063100 WO 20200511
- Main IPC: G01B9/02002
- IPC: G01B9/02002 ; G01B9/02055 ; G01J9/02 ; G03F7/20

Abstract:
An interferometer system including: an optical system arranged to split a radiation beam from a laser source into a first beam along a first optical path and a second beam along a second optical path, and recombine the first beam and the second beam to a recombined beam, a detector to receive the recombined beam and to provide a detector signal based on the received recombined beam, and a processing unit, wherein a first optical path length of the first optical path and a second optical path length of the second optical path have an optical path length difference, and wherein the processing unit is arranged to determine a mode hop of the laser source on the basis of a phase shift in the detector signal.
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