- 专利标题： LITHOGRAPHIC APPARATUS AND ILLUMINATION UNIFORMITY CORRECTION SYSTEM
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申请号： US17605601申请日： 2020-04-14
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公开(公告)号： US20220214622A1公开(公告)日： 2022-07-07
- 发明人: Janardan NATH , Kalyan Kumar MANKALA , Todd R. DOWNEY , Joseph Harry LYONS , Ozer UNLUHISARCIKLI , Alexander Harris LEDBETTER , Nicholas Stephen APONE , Tian GANG
- 申请人： ASML HOLDING N.V. , ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven; NL Veldhoven
- 专利权人： ASML HOLDING N.V.,ASML NETHERLANDS B.V.
- 当前专利权人： ASML HOLDING N.V.,ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven; NL Veldhoven
- 国际申请： PCT/EP2020/060376 WO 20200414
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.
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