Invention Application
- Patent Title: RESISTIVE RANDOM ACCESS MEMORY AND METHOD OF FABRICATING THE SAME
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Application No.: US17392268Application Date: 2021-08-03
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Publication No.: US20220216401A1Publication Date: 2022-07-07
- Inventor: Po-Yen Hsu , Bo-Lun Wu , Shih-Ning Tsai , Tse-Mian Kuo
- Applicant: Winbond Electronics Corp.
- Applicant Address: TW Taichung City
- Assignee: Winbond Electronics Corp.
- Current Assignee: Winbond Electronics Corp.
- Current Assignee Address: TW Taichung City
- Priority: TW110100451 20210106
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
A resistive random access memory, including a first electrode layer and a second electrode layer disposed opposite to each other, a variable resistance layer located between the first electrode layer and the second electrode layer, an oxygen exchange layer located between the variable resistance layer and the second electrode layer, a vacancy-supplying layer surrounding a middle sidewall of the oxygen exchange layer; and a vacancy-driving electrode layer located on the vacancy-supply layer and surrounding an upper sidewall of the oxygen exchange layer, is provided. A method of fabricating the resistive random access memory is also provided.
Public/Granted literature
- US11793095B2 Resistive random access memory and method of fabricating the same Public/Granted day:2023-10-17
Information query
IPC分类: