Invention Application
- Patent Title: Apparatus and Method for Vacuum Deposition
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Application No.: US17711260Application Date: 2022-04-01
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Publication No.: US20220228252A1Publication Date: 2022-07-21
- Inventor: Sergio PACE , Eric SILBERBERG , Dimitri WILDERS , Rémy BONNEMANN , Lucie GAOUYAT
- Applicant: ArcelorMittal
- Applicant Address: LU Luxembourg
- Assignee: ArcelorMittal
- Current Assignee: ArcelorMittal
- Current Assignee Address: LU Luxembourg
- Priority: IBPCT/IB2016/054477 20160727
- Main IPC: C23C14/24
- IPC: C23C14/24 ; C23C14/02 ; C23C14/14 ; C23C14/56

Abstract:
A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.
Public/Granted literature
- US11781213B2 Apparatus and method for vacuum deposition Public/Granted day:2023-10-10
Information query
IPC分类: