-
公开(公告)号：US20240401188A1
公开(公告)日：2024-12-05
申请号：US18800276
申请日：2024-08-12
Applicant: ArcelorMittal
Inventor： Eric SILBERBERG , Thiago RABELO NUNES CAMPOS , Negar GILANI
Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a coated metallic substrate.
-
公开(公告)号：US20240401183A1
公开(公告)日：2024-12-05
申请号：US18807440
申请日：2024-08-16
Applicant: ArcelorMittal
Inventor： Eric SILBERBERG , Sergio PACE , Remy BONNEMANN
Abstract: A coated substrate obtainable by a method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber. A vacuum deposition facility for producing such coated substrates.
-
公开(公告)号：US20220228252A1
公开(公告)日：2022-07-21
申请号：US17711260
申请日：2022-04-01
Applicant: ArcelorMittal
Inventor： Sergio PACE , Eric SILBERBERG , Dimitri WILDERS , Rémy BONNEMANN , Lucie GAOUYAT
Abstract: A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.
-
公开(公告)号：US20210164088A1
公开(公告)日：2021-06-03
申请号：US16770850
申请日：2018-12-11
Applicant: ArcelorMittal
Inventor： Eric SILBERBERG , Bruno SCHMITZ , Sergio PACE , Remy BONNEMANN , Didier MARNEFFE
Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including—a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes: a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.
-
公开(公告)号：US20210254205A1
公开(公告)日：2021-08-19
申请号：US16973097
申请日：2019-04-23
Applicant: ARCELORMITTAL
Inventor： Eric SILBERBERG , Sergio PACE , Remy BONNEMANN
Abstract: A method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber; a coated substrate coated with at least one metal and a vacuum deposition facility for the method for continuously depositing on a running substrate.
-
Patent Agency Ranking
公开(公告)号：US20210238735A1
公开(公告)日：2021-08-05
申请号：US16973114
申请日：2019-04-23
Applicant: ARCELORMITTAL
Inventor： Eric SILBERBERG , Thiago RABELO NUNES CAMPOS , Negar GILANI
Abstract: A method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a vacuum deposition facility.
-
公开(公告)号：US20190242006A1
公开(公告)日：2019-08-08
申请号：US16318563
申请日：2017-07-27
Applicant: ArcelorMittal
Inventor： Sergio PACE , Eric SILBERBERG , Dimitri WILDERS , Rémy BONNEMANN , Lucie GAOUYAT
CPC classification number: C23C14/246 , C23C14/021 , C23C14/14 , C23C14/562
Abstract: A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.
-
公开(公告)号：US20250018424A1
公开(公告)日：2025-01-16
申请号：US18716389
申请日：2022-12-09
Applicant: ArcelorMittal
Inventor： Fabrice FARINA , Jacky MALLEGOL , Eric SILBERBERG , Charles HANQUET , Thomas DEFIZE
Abstract: A method for managing the gloss of an organic coating formed on a moving strip on a coil-coating line, the method including the steps of: 1) Setting a set gloss value Gs, a set gloss range Rs and a proportionality constant K of a predefined linear mathematical relation between the temperature of the wet film before UV curing and the gloss, 2) Collecting the measure of the temperature T of the wet film in at least a width portion of the moving strip upstream of the UV curing device and collecting the measure of the gloss G, 3) Correcting a deviation of the measured gloss G beyond Rs, this step including a sub-step of calculating the corrected temperature Tc to be reached by the wet film in the width portion upstream of the UV curing device according to equation: Tc=T+K(G−Gs).
-
公开(公告)号：US20210230736A1
公开(公告)日：2021-07-29
申请号：US15734911
申请日：2019-04-23
Applicant: ArcelorMittal
Inventor： Eric SILBERBERG , Sergio PACE , Remy BONNEMANN
Abstract: A Method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber; a substrate coated with at least one metal on both sides of the substrate having an average thickness, wherein the coating is deposited homogenously such that the maximum thickness of the coating can exceed the average thickness of 15% maximum. A vacuum deposition facility also is provided.
-
公开(公告)号：US20210238734A1
公开(公告)日：2021-08-05
申请号：US16972176
申请日：2019-06-11
Applicant: ArcelorMittal
Inventor： Sergio PACE , Bruno SCHMITZ , Didier MARNEFFE , Eric SILBERBERG
Abstract: A vacuum deposition facility 1 for continuously depositing, on a running substrate S, coatings formed from metal or metal alloy, the facility including an evaporation crucible 4 suited to supply metal or metal alloy vapor and including an evaporation pipe 7, a deposition chamber 2 suited to have the substrate S run through along a given path P and a vapor jet coater 3 linking the evaporation pipe to the deposition chamber, wherein the vapor jet coater further includes a repartition chamber 31 including at least one reheater 33 positioned within the repartition chamber and a vapor outlet orifice 32 including a base opening linking the vapor outlet orifice to the repartition chamber, a top opening through which the vapor can exit in the deposition chamber and two sides converging toward each other in the direction of the top opening.
-
-
-
-
-
-
-
-
-
Search Results
12
records
(took 0.011 seconds)
