公开(公告)号：US20190242006A1

公开(公告)日：2019-08-08

申请号：US16318563

申请日：2017-07-27

Applicant: ArcelorMittal

Inventor： Sergio PACE ,  Eric SILBERBERG ,  Dimitri WILDERS ,  Rémy BONNEMANN ,  Lucie GAOUYAT

IPC: C23C14/24 ,  C23C14/56 ,  C23C14/02 ,  C23C14/14

CPC classification number: C23C14/246 ,  C23C14/021 ,  C23C14/14 ,  C23C14/562

Abstract: A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.

公开(公告)号：US20200263289A1

公开(公告)日：2020-08-20

申请号：US16642471

申请日：2018-07-20

Applicant: ARCELORMITTAL

Inventor： Daniel CHALEIX ,  Christian ALLELY ,  Eric SILBERBERG ,  Sergio PACE ,  Lucie GAOUYAT

IPC: C23C14/16 ,  C23C14/35 ,  C23C14/34 ,  C23C14/56 ,  C23C14/02

Abstract: A coated metallic substrate including at least a first coating consisting of aluminum is provided. The first coating has a thickness between 1.0 and 4.5 μm and is directly topped by a second coating based on zinc, such second coating having a thickness between 1.5 and 9.0 μm. The thickness ratio of the first coating with respect to the second coating is between 0.2 and 1.2.

公开(公告)号：US20220228252A1

公开(公告)日：2022-07-21

申请号：US17711260

申请日：2022-04-01

Applicant: ArcelorMittal

Inventor： Sergio PACE ,  Eric SILBERBERG ,  Dimitri WILDERS ,  Rémy BONNEMANN ,  Lucie GAOUYAT

IPC: C23C14/24 ,  C23C14/02 ,  C23C14/14 ,  C23C14/56

Abstract: A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.