- 专利标题: METHOD FOR FORMING METAL PATTERN
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申请号: US17613569申请日: 2020-06-18
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公开(公告)号: US20220248538A1公开(公告)日: 2022-08-04
- 发明人: Kenjiro KOSHIJI , Yuichi MAKITA , Noriaki NAKAMURA , Masato KASUGA , Yuusuke OHSHIMA , Hiroki SATO , Shigeyuki OOTAKE , Hitoshi KUBO
- 申请人: TANAKA KIKINZOKU KOGYO K.K.
- 申请人地址: JP Tokyo
- 专利权人: TANAKA KIKINZOKU KOGYO K.K.
- 当前专利权人: TANAKA KIKINZOKU KOGYO K.K.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2019-114430 20190620
- 国际申请: PCT/JP2020/024012 WO 20200618
- 主分类号: H05K3/12
- IPC分类号: H05K3/12 ; C09D11/03 ; C09D11/52 ; B05D5/06 ; B05D7/00 ; B05D7/24 ; B05D3/10
摘要:
The present invention relates to a method for forming a metal pattern on a pattern formation section set on a base material. In the present invention, a substrate provided with a fluorine-containing resin layer on a surface of the base material including the pattern formation section is used. The present inventive method for forming a metal pattern includes steps of: forming a functional group on the pattern formation section; and applying a metal ink including an amine compound and a fatty acid as protective agents to the base material surface to fix the metal particles on the pattern formation section. In the present invention, a fluorine-containing resin having a surface free energy measured by the Owens-Wendt method of 13 mN/m or more and 20 mN/m or less is applied as the fluorine-containing resin layer. Further, a metal ink including ethyl cellulose as an additive is applied as the metal ink.
公开/授权文献
- US11864325B2 Method for forming metal pattern 公开/授权日:2024-01-02
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