Invention Application
- Patent Title: SUBSTRATE SHAPE MEASURING DEVICE, SUBSTRATE HANDLING DEVICE, SUBSTRATE SHAPE MEASURING UNIT AND METHOD TO HANDLE SUBSTRATES
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Application No.: US17625467Application Date: 2020-06-08
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Publication No.: US20220276565A1Publication Date: 2022-09-01
- Inventor: Gijs KRAMER , Ringo Petrus Cornelis VAN DORST
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP19185930.5 20190712
- International Application: PCT/EP2020/065873 WO 20200608
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/67
Abstract:
A substrate shape measuring device, including: a substrate support to support a substrate having a main surface, the main surface of the substrate when supported by the substrate support substantially extending in a first plane; one or more sensor assemblies, each including a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light; and a processing device arranged to determine a shape of the substrate, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane.
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Information query
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