Invention Application
- Patent Title: METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING ALUMINUM, TITANIUM, AND CARBON
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Application No.: US17685525Application Date: 2022-03-03
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Publication No.: US20220285147A1Publication Date: 2022-09-08
- Inventor: Lifu Chen , Qi Xie , Charles Dezelah , Petro Deminskyi , Giuseppe Alessio Verni , Petri Raisanen , Eric James Shero
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/455 ; C23C16/52 ; C23C16/08
Abstract:
Disclosed are methods and systems for depositing layers comprising a titanium, aluminum, and carbon. The layers are formed onto a surface of a substrate. The deposition process comprises a cyclical deposition process. Exemplary structures in which the layers may be incorporated include field effect transistors, VNAND cells, metal-insulator-metal (MIM) structures, and DRAM capacitors.
Information query
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