Invention Application
- Patent Title: TRANSISTOR, METHOD FOR MANUFACTURING SAME, AND TERNARY INVERTER COMPRISING SAME
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Application No.: US17636328Application Date: 2020-11-19
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Publication No.: US20220285484A1Publication Date: 2022-09-08
- Inventor: Kyung Rok Kim , Ji Won Chang , Jae Won Jeong , Youngeun Choi , Wooseok Kim
- Applicant: UNIST(ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Applicant Address: KR Ulsan
- Assignee: UNIST(ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Current Assignee: UNIST(ULSAN NATIONAL INSTITUTE OF SCIENCE AND TECHNOLOGY)
- Current Assignee Address: KR Ulsan
- Priority: KR10-2019-0149122 20191119,KR10-2020-0056670 20200512,KR10-2020-0087155 20200714
- International Application: PCT/KR2020/016414 WO 20201119
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L21/265 ; H01L27/092 ; H01L29/786 ; H01L29/423 ; H01L29/66

Abstract:
A transistor includes: a substrate; a constant current formation layer provided on the substrate; a pair of source/drain patterns provided on the constant current formation layer; a gate electrode provided between the pair of source/drain patterns; a channel pattern extending in a direction between the pair of source/drain patterns; and a gate insulating layer surrounding the channel pattern, wherein the channel pattern penetrates the gate insulating layer and the gate electrode and is electrically connected to the source pattern and the drain pattern, the gate insulating layer separates the channel pattern and the gate electrode from each other, the constant current formation layer generates a constant current between the drain pattern and the substrate, and the constant current is independent from a gate voltage applied to the gate electrode.
Information query
IPC分类: