发明申请
- 专利标题: DUAL PYROMETER SYSTEMS FOR SUBSTRATE TEMPERATURE CONTROL DURING FILM DEPOSITION
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申请号: US17697145申请日: 2022-03-17
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公开(公告)号: US20220301905A1公开(公告)日: 2022-09-22
- 发明人: Han Ye , Kai Zhou , Peipei Gao , Wentao Wang , Kishor Patil , Fan Gao , Krishnaswamy Mahadevan , Xing Lin , Alexandros Demos
- 申请人: ASM IP Holding B.V.
- 申请人地址: NL Almere
- 专利权人: ASM IP Holding B.V.
- 当前专利权人: ASM IP Holding B.V.
- 当前专利权人地址: NL Almere
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; H01L21/66 ; C23C16/46 ; C23C16/52
摘要:
A method of operating a reactor system to provide multi-zone substrate temperature control. The method includes, with a first pyrometer, sensing a temperature of a first zone of a substrate supported in the reactor system, and, with a second pyrometer, sensing a temperature of a second zone of the substrate. The method further includes, with a controller, comparing the temperatures of the first and second zones to setpoint temperatures for the first and second zones and, in response, generating control signals to control heating of the substrate. The method also includes controlling, based on the control signals, operations of a heater assembly operating to heat the substrate.
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