Invention Application
- Patent Title: SILVER ELECTROPLATING COMPOSITIONS AND METHODS FOR ELECTROPLATING SILVER WITH LOW COEFFICIENTS OF FRICTION
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Application No.: US17592056Application Date: 2022-02-03
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Publication No.: US20220307149A1Publication Date: 2022-09-29
- Inventor: Youngmin Yoon , Miguel A. Rodriguez , Michael Lipschutz , Jamie Y. C. Chen , Kristen Griffin
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Main IPC: C25D3/46
- IPC: C25D3/46

Abstract:
Silver electroplating compositions deposit silver with low coefficients of friction on substrates, such as nickel, copper and copper alloys. The silver deposits have coefficients of friction of less than or equal to 1 in contrast to many conventional silver deposits which typically have coefficients of friction greater than 1, such as 1.5. The silver deposits also have improved wear resistance in contrast to silver deposited from many conventional silver electroplating baths. The low coefficients of friction and improved wear resistance of silver deposited from the silver electroplating compositions is especially suitable for connectors and electronics finishes. Preferably, the silver electroplating compositions are cyanide-free silver electroplating compositions.
Public/Granted literature
- US11578418B2 Silver electroplating compositions and methods for electroplating silver with low coefficients of friction Public/Granted day:2023-02-14
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