- 专利标题： METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC MATERIAL, PATTERN FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC MATERIAL, CONTAINER, AND QUALITY INSPECTION METHOD
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申请号： US17839432申请日： 2022-06-13
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公开(公告)号： US20220317563A1公开(公告)日： 2022-10-06
- 发明人: Tetsuya SHIMIZU , Tsukasa YAMANAKA , Yukihisa KAWADA
- 申请人： FUJIFILM Corporation
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 优先权： JP2016-072917 20160331,JP2017-044273 20170308
- 主分类号： G03F1/68
- IPC分类号： G03F1/68 ; G03F7/40 ; G03F7/32 ; G03F7/11 ; G03F7/039 ; G03F7/16 ; G03F7/00 ; G03F1/86 ; G03F7/38 ; H01J49/10
摘要：
A container for storing a chemical fluid for manufacturing an electronic material, in which after an inspection solution charges the container and stored at 25° C. for 30 days, a sum of a concentration of particulate metal including an iron atom, a concentration of particulate metal including a copper atom, and a concentration of particulate metal including a zinc atom which are measured by a Single Particle ICP-MASS method in the inspection solution is 100 ppt or less.
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