- 专利标题: SPATIAL OPTICAL EMISSION SPECTROSCOPY FOR ETCH UNIFORMITY
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申请号: US17234940申请日: 2021-04-20
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公开(公告)号: US20220333989A1公开(公告)日: 2022-10-20
- 发明人: Blake Erickson , Keith Berding , Michael Kutney , Zhaozhao Zhu , Tsung Feng Wu , Michael D. Willwerth , Jeffrey Ludwig
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: G01J3/32
- IPC分类号: G01J3/32 ; G01N21/25 ; G01J3/02
摘要:
An apparatus includes a base component and collimators housed within the base component. The collimators correspond to collection cylinders for sampling optical emission spectroscopy (OES) signals with respect to locations of a wafer in an etch chamber. The apparatus further includes a guide, operatively coupled to the plurality of collimators, to guide the sampling of the OES signals along paths for sampling the OES signals.
公开/授权文献
- US11668602B2 Spatial optical emission spectroscopy for etch uniformity 公开/授权日:2023-06-06
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