Invention Application
- Patent Title: METHOD AND SYSTEM FOR DETECTING ANOMALIES IN A SEMICONDUCTOR PROCESSING SYSTEM
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Application No.: US17240677Application Date: 2021-04-26
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Publication No.: US20220341821A1Publication Date: 2022-10-27
- Inventor: Ryan T. DOWNEY , Hemant P. MUNGEKAR , James L'HEUREUX , Andreas NEUBER , Michael W. JOHNSON , Joseph A. VAN GOMPEL , Gino Gerardo CRISPIERI , Tony H. TONG , Maxime CAYER , John L. KOENIG , Mike M. HUANG
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: G01M99/00
- IPC: G01M99/00

Abstract:
The present disclosure relates to systems and methods for detecting anomalies in a semiconductor processing system. According to certain embodiments, one or more external sensors are mounted to a sub-fab component, communicating with the processing system via a communication channel different than a communication channel utilized by the sub-fab component and providing extrinsic sensor data that the sub-fab component is not configured to provide. The extrinsic sensor data may be combined with sensor data from a processing tool of the system and/or intrinsic sensor data of the sub-fab component to form virtual sensor data. In the event the virtual data exceeds or falls below a threshold, an intervention or a maintenance signal is dispatched, and in certain embodiments, an intervention or maintenance action is taken by the system.
Public/Granted literature
- US12203828B2 Method and system for detecting anomalies in a semiconductor processing system Public/Granted day:2025-01-21
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