Invention Application
- Patent Title: COCKTAIL LAYER OVER GATE DIELECTRIC LAYER OF FET FERAM
-
Application No.: US17873236Application Date: 2022-07-26
-
Publication No.: US20220359544A1Publication Date: 2022-11-10
- Inventor: Rainer Yen-Chieh Huang , Hai-Ching Chen , Chung-Te Lin
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Main IPC: H01L27/1159
- IPC: H01L27/1159 ; H01L21/28 ; H01L29/51 ; H01L23/522 ; H01L29/66 ; H01L29/78

Abstract:
In some embodiments, the present disclosure relates to an integrated chip that includes a gate electrode arranged over a substrate. A gate dielectric layer is arranged over the gate electrode, and an active structure is arranged over the gate dielectric layer. A source contact and a drain contact are arranged over the active structure. The active structure includes a stack of cocktail layers alternating with first active layers. The cocktail layers include a mixture of a first material and a second material. The first active layers include a third material that is different than the first and second materials. The bottommost layer of the active structure is one of the cocktail layers.
Public/Granted literature
- US11818896B2 Cocktail layer over gate dielectric layer of FET FeRAM Public/Granted day:2023-11-14
Information query
IPC分类: