Invention Application
- Patent Title: PHOTOPOLYMERIZABLE BLOCK POLYMERS AND METHODS OF PRODUCING AND USING THE SAME
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Application No.: US17728900Application Date: 2022-04-25
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Publication No.: US20220363792A1Publication Date: 2022-11-17
- Inventor: Umesh Upendra Choudhary , Jessica Kalay Su , Michael Christopher Cole , Jennifer Marie Chavez
- Applicant: Align Technology, Inc.
- Applicant Address: US CA San Jose
- Assignee: Align Technology, Inc.
- Current Assignee: Align Technology, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: C08F220/12
- IPC: C08F220/12
Abstract:
Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.
Public/Granted literature
- US12049528B2 Photopolymerizable block polymers and methods of producing and using the same Public/Granted day:2024-07-30
Information query
IPC分类:
