公开(公告)号：US20220363792A1

公开(公告)日：2022-11-17

申请号：US17728900

申请日：2022-04-25

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra Choudhary ,  Jessica Kalay Su ,  Michael Christopher Cole ,  Jennifer Marie Chavez

IPC: C08F220/12

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.

公开(公告)号：US12049528B2

公开(公告)日：2024-07-30

申请号：US17728900

申请日：2022-04-25

Applicant: Align Technology, Inc.

Inventor： Umesh Upendra Choudhary ,  Jessica Kalay Su ,  Michael Christopher Cole ,  Jennifer Marie Chavez

IPC: C08F2/46 ,  C08F2/50 ,  C08F220/12 ,  C08F220/30 ,  C08G61/04 ,  A61C7/00 ,  B33Y70/00 ,  B33Y80/00

CPC classification number: C08F220/12 ,  C08F2/50 ,  C08F220/301 ,  C08F220/302 ,  A61C7/00 ,  B33Y70/00 ,  B33Y80/00

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.