Invention Application
- Patent Title: HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD FOR FORMING THE SAME
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Application No.: US17367640Application Date: 2021-07-06
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Publication No.: US20220376100A1Publication Date: 2022-11-24
- Inventor: Po-Yu Yang , Hsun-Wen Wang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu City
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu City
- Priority: CN202110563682.7 20210524
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/66 ; H01L29/06

Abstract:
A high electron mobility transistor includes an epitaxial stack on a substrate, a gate structure on the epitaxial stack, a passivation layer on the epitaxial stack and covering the gate structure, and an air gap between the passivation layer and the gate structure.
Public/Granted literature
- US12051740B2 High electron mobility transistor and method for forming the same Public/Granted day:2024-07-30
Information query
IPC分类: