Invention Application
- Patent Title: METHOD FOR PRODUCING RESIN, METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND RESIN
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Application No.: US17724873Application Date: 2022-04-20
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Publication No.: US20220382151A1Publication Date: 2022-12-01
- Inventor: Tomoaki YOSHIOKA , Shuhei Yamaguchi , Eiji Fukuzaki , Taro Miyoshi
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2021-078811 20210506
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/038 ; C08F212/14 ; C08F8/34
Abstract:
A method for producing a resin having a repeating unit that is decomposed by irradiation of an actinic ray or a radiation to generate acid, the method including polymerizing a specific compound represented by General formula (P-1) and a copolymerizable monomer compound, a method for producing an actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a resin corresponding to a reaction intermediate of the resin.
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