公开(公告)号：US12164230B2

公开(公告)日：2024-12-10

申请号：US17166321

申请日：2021-02-03

Applicant: FUJIFILM Corporation

Inventor： Taro Miyoshi ,  Yasunori Yonekuta ,  Eiji Fukuzaki

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a solubility in an alkali developer that increases through decomposition by an action of an acid and (B) a compound that generates an acid upon irradiation with actinic rays or radiation and is represented by a specific structure; an actinic ray-sensitive or radiation-sensitive film using the composition; a pattern forming method; a method for manufacturing an electronic device; and a compound.

公开(公告)号：US20230384674A1

公开(公告)日：2023-11-30

申请号：US18448505

申请日：2023-08-11

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Taro Miyoshi ,  Tomoaki Yoshioka ,  Eiji Fukuzaki

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F212/14 ,  C08F220/18 ,  C08F220/30

CPC classification number: G03F7/039 ,  G03F7/038 ,  G03F7/0045 ,  C08F212/24 ,  C08F220/1818 ,  C08F220/301 ,  C08F220/302 ,  C08F220/303 ,  C08F212/30

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition with which LWR of a pattern to be formed can be reduced; a resist film; a pattern forming method; and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit (a), in which the repeating unit (a) is a repeating unit having an ionic group which generates an acid in a case where a leaving group is eliminated by irradiation with an actinic ray or a radiation, in which a repeating unit obtained by replacing the leaving group with a hydrogen atom has a molecular weight of 300 or less, and the repeating unit (a) is a predetermined amount or more with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US20220382151A1

公开(公告)日：2022-12-01

申请号：US17724873

申请日：2022-04-20

Applicant: FUJIFILM Corporation

Inventor： Tomoaki YOSHIOKA ,  Shuhei Yamaguchi ,  Eiji Fukuzaki ,  Taro Miyoshi

IPC: G03F7/039 ,  G03F7/038 ,  C08F212/14 ,  C08F8/34

Abstract: A method for producing a resin having a repeating unit that is decomposed by irradiation of an actinic ray or a radiation to generate acid, the method including polymerizing a specific compound represented by General formula (P-1) and a copolymerizable monomer compound, a method for producing an actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a resin corresponding to a reaction intermediate of the resin.

公开(公告)号：US20210373438A1

公开(公告)日：2021-12-02

申请号：US17393889

申请日：2021-08-04

Applicant: FUJIFILM Corporation

Inventor： Kotaro TAKAHASHI ,  Yasunori Yonekuta ,  Taro Miyoshi

IPC: G03F7/004 ,  C07D235/18 ,  C07D277/66 ,  C07D263/57 ,  C08F212/14

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a solubility in a developer, which changes by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation; and an acid diffusion control agent, in which a molecular weight of the acid diffusion control agent is 420 or more, and a distance Ra between a Hansen solubility parameter of the acid diffusion control agent and a Hansen solubility parameter of the air satisfies 15≤Ra≤45.