- 专利标题: STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING POLYMERIC ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION
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申请号: US17365172申请日: 2021-07-01
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公开(公告)号: US20220396691A1公开(公告)日: 2022-12-15
- 发明人: J. Mon Hei ENG , Joseph KOZAKIEWICZ , Ram B. GUPTA , Jian-Yang CHO , Roderick G. RYLES , Fadi KHAWAM
- 申请人: Cytec Industries Inc.
- 申请人地址: US NJ Princeton
- 专利权人: Cytec Industries Inc.
- 当前专利权人: Cytec Industries Inc.
- 当前专利权人地址: US NJ Princeton
- 主分类号: C08L23/12
- IPC分类号: C08L23/12 ; C08K5/3492 ; C08K5/00 ; C08K5/3475 ; C08K5/357 ; C08K5/06 ; C08K5/132 ; C08K5/134 ; C08K5/1535 ; C08L23/06 ; C08L77/06
摘要:
Stabilizer compositions having a stabilizing amount of at least one co-active agent; an ultraviolet light absorber chosen from an ortho-hydroxy benzophenone, and/or an ortho-hydroxyphenyl benzotriazole; and a hindered amine light stabilizer, are provided herein, along with masterbatch concentrates containing same, and processes for using same for stabilizing polymeric organic materials to protect against light and thermal degradation due to exposure to UV irradiation.
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