Invention Application
- Patent Title: DIAPHRAGM VALVE, FLOW CONTROL DEVICE, FLUID CONTROL DEVICE, AND SEMICONDUCTOR MANUFACTURING DEVICE
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Application No.: US17782769Application Date: 2020-12-07
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Publication No.: US20230003306A1Publication Date: 2023-01-05
- Inventor: Kohei SHIGYOU , Takashi HIROSE
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Priority: JP2019-238214 20191227
- International Application: PCT/JP2020/045391 WO 20201207
- Main IPC: F16K7/16
- IPC: F16K7/16 ; F16K31/00

Abstract:
A diaphragm valve including: a valve body having a flow path formed therein and a valve chamber recessed from an upper surface of the valve body; a diaphragm that is disposed in the valve chamber and elastically deformable to open and close the flow path and adjust an opening degree of the flow path; a stem for pressing the diaphragm to elastically deform the diaphragm; an actuator for driving the stem; a support mechanism that is fixed to the valve body and supports the stem and the actuator; wherein the stem includes a first stem member connected to the actuator via a displacement transmitting member, and a second stem member held by the support mechanism so as to be movable in the axial direction via a sleeve, the second stem member has an upper end portion which abuts against a lower end portion of the first stem member.
Public/Granted literature
- US11892100B2 Diaphragm valve, flow control device, fluid control device, and semiconductor manufacturing device Public/Granted day:2024-02-06
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