Invention Application
- Patent Title: SYSTEM FOR INSPECTING AND GROUNDING A MASK IN A CHARGED PARTICLE SYSTEM
-
Application No.: US17778579Application Date: 2020-10-21
-
Publication No.: US20230005698A1Publication Date: 2023-01-05
- Inventor: Tianming CHEN , Chiyan KUAN , Yixiang WANG , Zhi Po WANG
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2020/079674 WO 20201021
- Main IPC: H01J37/02
- IPC: H01J37/02 ; G03F7/20

Abstract:
A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.
Public/Granted literature
- US12142451B2 System for inspecting and grounding a mask in a charged particle system Public/Granted day:2024-11-12
Information query