Invention Publication
- Patent Title: PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE
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Application No.: US18056332Application Date: 2022-11-17
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Publication No.: US20230152694A1Publication Date: 2023-05-18
- Inventor: HONGGU IM , Sumin Kim , Yechan Kim , Jinjoo Kim , Hyunwoo Kim , Sunghwan Park , Juhyeon Park , Jicheol Park , Giyoung Song , Sukkoo Hong
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR 20210159817 2021.11.18
- Main IPC: G03F7/038
- IPC: G03F7/038
Abstract:
Photoresist compositions may include a photosensitive polymer including a first repeating unit of Chemical Formula 1; a photoacid generator (PAG); and a solvent.
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