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1.发明公开公开(公告)号：US20240239820A1
公开(公告)日：2024-07-18
申请号：US18329976
申请日：2023-06-06
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghyun HAN , Haengdeog Koh , Yoonhyun Kwak , Kyungoh Kim , Mijeong Kim , Jaejun Lee , Hasup Lee , Kyuhyun IM , Sukkoo Hong
CPC classification number: C07F7/2224 , G03F7/0042 , G03F7/0048 , G03F7/2004
Abstract: Provided are an organometallic compound represented by one of Formulas 1-1 to 1-4 below.
a resist composition including the same, and a pattern forming method using the same. For descriptions of M11, L11 to L14, a11 to a14, R11 to R14, X11 to X14, n11 to n15, Y11 to Y13, and R15 to R17 in Formulas 1-1 to 1-4, refer to the specification.-
公开(公告)号：US11693315B2
公开(公告)日：2023-07-04
申请号：US17238355
申请日：2021-04-23
Applicant: Samsung Electronics Co., Ltd.
Inventor： Eunkyung Lee , Sumin Kim , Hyunwoo Kim , Juhyeon Park , Giyoung Song , Sukkoo Hong , Yoonhyun Kwak , Youngmin Nam , Byunghee Sohn , Sunyoung Lee , Aram Jeon , Sungwon Choi
IPC: G03F7/004 , G03F7/038 , G03F7/039 , C07C309/12 , C07D333/76 , C07C381/12
CPC classification number: G03F7/0045 , C07C309/12 , C07C381/12 , C07D333/76 , G03F7/038 , G03F7/039 , C07C2603/74
Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:
wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.-
Patent Agency Ranking
公开(公告)号：US11650502B2
公开(公告)日：2023-05-16
申请号：US16695569
申请日：2019-11-26
Applicant: SAMSUNG ELECTRONICS CO., LTD. , Dongjin Semichem Co., Ltd.
Inventor： Miyeong Kang , Sukkoo Hong , Hyereun Kim , Jihyun Kim , Hyunjin Kim , Hyojung Roh , Jongkyoung Park , Jungyoul Lee
CPC classification number: G03F7/091 , C08G18/3802 , C08G18/3819 , C08G18/792 , C09D175/04 , G03F7/038 , G03F7/039
Abstract: A polymer having a repeating unit represented by Formula 1:
wherein each of R1, R2, and R3 is independently selected from a substituted or unsubstituted C1-C6 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms or a substituted or unsubstituted C3-C6 cyclic saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms, wherein at least one of R1, R2, and R3 is a hydrocarbon group substituted with a fluorine atom. R4 is a C1-C10 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 second heteroatoms or a C3-C10 cyclic saturated or unsaturated hydrocarbon group having 0 to 2 second heteroatoms. R5 is a C1-C10 chain-like saturated or unsaturated hydrocarbon group having 1 to 6 third heteroatoms or a C3-C10 cyclic saturated or unsaturated hydrocarbon group having 1 to 6 third heteroatoms.-
公开(公告)号：US11982940B2
公开(公告)日：2024-05-14
申请号：US18313555
申请日：2023-05-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Eunkyung Lee , Sumin Kim , Hyunwoo Kim , Juhyeon Park , Giyoung Song , Sukkoo Hong , Yoonhyun Kwak , Youngmin Nam , Byunghee Sohn , Sunyoung Lee , Aram Jeon , Sungwon Choi
IPC: G03F7/004 , C07C309/12 , C07C381/12 , C07D333/76 , G03F7/038 , G03F7/039
CPC classification number: G03F7/0045 , C07C309/12 , C07C381/12 , C07D333/76 , G03F7/038 , G03F7/039 , C07C2603/74
Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:
wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.-
公开(公告)号：US11662662B2
公开(公告)日：2023-05-30
申请号：US16994957
申请日：2020-08-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hyunji Song , Sukkoo Hong , Sumin Kim , Yechan Kim , Juyoung Kim , Jinjoo Kim , Hyunwoo Kim , Juhyeon Park , Songse Yi
IPC: G03F7/004 , G03F7/039 , C07D213/68 , C07D263/32 , C07D233/64 , C07D277/26
CPC classification number: G03F7/0045 , C07D213/68 , C07D233/64 , C07D263/32 , C07D277/26 , G03F7/0392
Abstract: A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1:
wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.-
公开(公告)号：US20230152694A1
公开(公告)日：2023-05-18
申请号：US18056332
申请日：2022-11-17
Applicant: Samsung Electronics Co., Ltd.
Inventor： HONGGU IM , Sumin Kim , Yechan Kim , Jinjoo Kim , Hyunwoo Kim , Sunghwan Park , Juhyeon Park , Jicheol Park , Giyoung Song , Sukkoo Hong
IPC: G03F7/038
CPC classification number: G03F7/0384
Abstract: Photoresist compositions may include a photosensitive polymer including a first repeating unit of Chemical Formula 1; a photoacid generator (PAG); and a solvent.
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公开(公告)号：US20200310249A1
公开(公告)日：2020-10-01
申请号：US16695569
申请日：2019-11-26
Applicant: SAMSUNG ELECTRONICS CO., LTD. , Dongjin Semichem Co., Ltd.
Inventor： Miyeong KANG , Sukkoo Hong , Hyereun Kim , Jihyun Kim , Hyunjin Kim , Hyojung Roh , Jongkyoung Park , Jungyoul Lee
Abstract: A polymer having a repeating unit represented by Formula 1: wherein each of R1, R2, and R3 is independently selected from a substituted or unsubstituted C1-C6 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms or a substituted or unsubstituted C3-C6 cyclic saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms, wherein at least one of R1, R2, and R3 is a hydrocarbon group substituted with a fluorine atom. R4 is a C1-C10 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 second heteroatoms or a C3-C10 cyclic saturated or unsaturated hydrocarbon group having 0 to 2 second heteroatoms. R5 is a C1-C10 chain-like saturated or unsaturated hydrocarbon group having 1 to 6 third heteroatoms or a C3-C10 cyclic saturated or unsaturated hydrocarbon group having 1 to 6 third heteroatoms.
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