公开(公告)号：US11982940B2

公开(公告)日：2024-05-14

申请号：US18313555

申请日：2023-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung Lee ,  Sumin Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Giyoung Song ,  Sukkoo Hong ,  Yoonhyun Kwak ,  Youngmin Nam ,  Byunghee Sohn ,  Sunyoung Lee ,  Aram Jeon ,  Sungwon Choi

IPC: G03F7/004 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:




wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US20250102914A1

公开(公告)日：2025-03-27

申请号：US18639380

申请日：2024-04-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Honggu Im ,  Yonghoon Moon ,  Jeongju Park ,  Jicheol Park ,  Giyoung Song

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/38 ,  C08F228/02 ,  G03F7/038 ,  H01L21/027

Abstract: Photoresist compositions and methods of manufacturing an integrated circuit device by using said photoresist compositions are described. The photoresist compositions may include a photosensitive polymer, a photoacid generator (PAG), and a solvent, wherein the photosensitive polymer contains a sulfonate group (—SO2O—) bonded with an α-trifluoromethylbenzyl group.

公开(公告)号：US11693315B2

公开(公告)日：2023-07-04

申请号：US17238355

申请日：2021-04-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung Lee ,  Sumin Kim ,  Hyunwoo Kim ,  Juhyeon Park ,  Giyoung Song ,  Sukkoo Hong ,  Yoonhyun Kwak ,  Youngmin Nam ,  Byunghee Sohn ,  Sunyoung Lee ,  Aram Jeon ,  Sungwon Choi

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C309/12 ,  C07D333/76 ,  C07C381/12

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:




wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US20230152694A1

公开(公告)日：2023-05-18

申请号：US18056332

申请日：2022-11-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： HONGGU IM ,  Sumin Kim ,  Yechan Kim ,  Jinjoo Kim ,  Hyunwoo Kim ,  Sunghwan Park ,  Juhyeon Park ,  Jicheol Park ,  Giyoung Song ,  Sukkoo Hong

IPC: G03F7/038

CPC classification number: G03F7/0384

Abstract: Photoresist compositions may include a photosensitive polymer including a first repeating unit of Chemical Formula 1; a photoacid generator (PAG); and a solvent.