Invention Publication
- Patent Title: BACKPRESSURE MONITORING APPARATUS
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Application No.: US17537807Application Date: 2021-11-30
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Publication No.: US20230168139A1Publication Date: 2023-06-01
- Inventor: Sukti Chatterjee , David Masayuki Ishikawa , Yuriy V. Melnik , David A. Britz , Lance A. Scudder
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: G01L13/00
- IPC: G01L13/00

Abstract:
Exemplary backpressure monitoring apparatuses may include a fluid supply source having a fluid port. The backpressure monitoring apparatuses may include a flow control mechanism fluidly coupled with the fluid port. The backpressure monitoring apparatuses may include a delivery tube fluidly coupled with the flow control mechanism and the fluid port. The backpressure monitoring apparatuses may include a pressure differential gauge fluidly coupled with the delivery tube. The pressure differential gauge may include an interface mechanism that is engageable with an outlet of a fluid flow device.
Public/Granted literature
- US11953390B2 Backpressure monitoring apparatus Public/Granted day:2024-04-09
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