Invention Publication
- Patent Title: Charged Particle Gun and Charged Particle Beam System
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Application No.: US17917305Application Date: 2020-04-23
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Publication No.: US20230178325A1Publication Date: 2023-06-08
- Inventor: Masahiro FUKUTA , Keigo KASUYA , Noriaki ARAI
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Minato-ku, Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Minato-ku, Tokyo
- International Application: PCT/JP2020/017560 2020.04.23
- Date entered country: 2022-10-06
- Main IPC: H01J37/07
- IPC: H01J37/07 ; H01J37/28

Abstract:
An electron gun 901 capable of suppressing an uneven temperature distribution at an extraction electrode and a length-measuring SEM 900 are provided. The electron gun 901 is equipped with: a charged particle source 1; an extraction electrode 3 for extracting charged particles from the charged particle source 1 and allowing some of the charged particles to pass while blocking some other charged particles; and an auxiliary structure 5 disposed in contact with the extraction electrode 3. The length-measuring SEM 900 is equipped with the electron gun 901 and a computer system 920 for controlling the electron gun 901.
Information query
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