- 专利标题： PHOTOCATHODE, AND METHOD FOR MANUFACTURING PHOTOCATHODE
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申请号： US17923949申请日： 2021-04-15
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公开(公告)号： US20230187161A1公开(公告)日： 2023-06-15
- 发明人: Atsushi NAKAMURA , Yusuke NODA
- 申请人： NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY , HAMAMATSU PHOTONICS K.K.
- 申请人地址： JP Shizuoka-shi, Shizuoka
- 专利权人： NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY,HAMAMATSU PHOTONICS K.K.
- 当前专利权人： NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY,HAMAMATSU PHOTONICS K.K.
- 当前专利权人地址： JP Shizuoka-shi, Shizuoka; JP Hamamatsu-shi, Shizuoka
- 优先权： JP 20088003 2020.05.20
- 国际申请： PCT/JP2021/015635 2021.04.15
- 进入国家日期： 2022-11-08
- 主分类号： H01J1/34
- IPC分类号： H01J1/34 ; H01J9/12 ; H01J43/08
摘要：
A photocathode 4 includes an optically transparent conductive layer provided between a translucent substrate and a photoelectric conversion layer. The optically transparent conductive layer is formed of a constituent material including carbon. A Raman spectrum of the constituent material has a peak of a band, a peak of a band, a peak of a band, and a peak of a band.
公开/授权文献
- US11728119B2 Photocathode, and method for manufacturing photocathode 公开/授权日：2023-08-15
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