- 专利标题: CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
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申请号: US18190286申请日: 2023-03-27
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公开(公告)号: US20230314938A1公开(公告)日: 2023-10-05
- 发明人: Masahiko SHIMADA , Koji ICHIKAWA
- 申请人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 申请人地址: JP Tokyo
- 专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP 22054624 2022.03.29
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; C08F220/18 ; G03F7/039 ; G03F7/038 ; C07C69/54 ; C07C43/29 ; C07C43/225 ; C07C43/23 ; C07C69/708
摘要:
Disclosed are a carboxylate represented by formula (I), a carboxylic acid generator, a resin, and a resist composition including the same.
wherein R1 and R2 each represent a hydroxy group, —O—R10, etc.; R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group, etc.; R10 represents an acid-labile group; A1 and A2 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5; X0 represents a single bond, a hydrocarbon group which may have a substituent; Rbb1 represents a hydrogen atom, a halogen atom, etc.; X10 represents a single bond, *—O—**, etc.; and L10 represents a single bond or a hydrocarbon group which may have a substituent.
wherein R1 and R2 each represent a hydroxy group, —O—R10, etc.; R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group, etc.; R10 represents an acid-labile group; A1 and A2 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5; X0 represents a single bond, a hydrocarbon group which may have a substituent; Rbb1 represents a hydrogen atom, a halogen atom, etc.; X10 represents a single bond, *—O—**, etc.; and L10 represents a single bond or a hydrocarbon group which may have a substituent.
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