Invention Publication
- Patent Title: TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS
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Application No.: US18025183Application Date: 2021-09-27
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Publication No.: US20230333485A1Publication Date: 2023-10-19
- Inventor: Wim Tjibbo TEL , Hermanus Adrianus DILLEN , Roy WERKMAN , David Frans Simon DECKERS
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP 198596.7 2020.09.28 EP 205996.0 2020.11.05
- International Application: PCT/EP2021/076480 2021.09.27
- Date entered country: 2023-03-07
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A substrate including a target structure formed in at least two layers. The target structure includes a first region having periodically repeating features in each of the layers measureable using optical metrology; and a second region having repetitions of one or more product features in each of the layers, the repetitions being sufficient for stochastic analysis to determine at least one local variation metric. The method also includes determining a correction for control of a lithographic process based on measurement of such a target structure.
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