- 专利标题: DETECTION UNIT, SEMICONDUCTOR FILM LAYER INSPECTION APPARATUS INCLUDING THE SAME, AND SEMICONDUCTOR FILM LAYER INSPECTION METHOD USING THE SAME
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申请号: US17945743申请日: 2022-09-15
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公开(公告)号: US20230341438A1公开(公告)日: 2023-10-26
- 发明人: Hyoung Sik KIM
- 申请人: ENGION CO., LTD.
- 申请人地址: KR Cheongju-si
- 专利权人: ENGION CO., LTD.
- 当前专利权人: ENGION CO., LTD.
- 当前专利权人地址: KR Cheongju-si
- 优先权: KR 20220048970 2022.04.20 KR 20220071600 2022.06.13
- 主分类号: G01R35/00
- IPC分类号: G01R35/00 ; G01R1/073 ; G01R31/26
摘要:
The present invention provides a semiconductor film layer inspection apparatus (10) for detecting the electrical characteristics of a semiconductor film layer (30) formed on one surface of a substrate (20) and including an oxide semiconductor layer (31), and a detection unit used therein. The apparatus includes a base unit (40), a detection unit (200) and a carrier generator (300 300a and 300b). The detection unit (200) includes: a detection probe pin (230) and a detection probe module (202). The detection probe pin (230) includes a detection probe pin body (231) and a detection probe pin contactor unit (233). The detection probe pin contactor unit at least partially forms a plurality of independently detectable and operable segmented pin contactor unit blocks.
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