发明公开
- 专利标题: PARTICLE REMOVER AND METHOD
-
申请号: US18448963申请日: 2023-08-13
-
公开(公告)号: US20230381701A1公开(公告)日: 2023-11-30
- 发明人: Wen-Hao Cheng , Hsuan-Chih Chu , Yen-Yu Chen
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 分案原申请号: US17387951 2021.07.28
- 主分类号: B01D45/14
- IPC分类号: B01D45/14 ; C23C16/455 ; C23C16/44
摘要:
A device for removing particles in a gas stream includes a first cylindrical portion configured to receive the gas stream containing a target gas and the particles, a rotatable device disposed within the first cylindrical portion and configured to generate a centrifugal force when in a rotational action to divert the particles away from the rotatable device, a second cylindrical portion coupled to the first cylindrical portion and configured to receive the target gas, and a third cylindrical portion coupled to the first cylindrical portion and surrounding the second cylindrical portion, the third cylindrical portion being configured to receive the diverted particles.
信息查询