Invention Application
- Patent Title: CHEMICAL LIQUID PURIFICATION METHOD AND CHEMICAL LIQUID
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Application No.: US17957408Application Date: 2022-09-30
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Publication No.: US20230087746A1Publication Date: 2023-03-23
- Inventor: Tetsuya KAMIMURA , Masahiro Yoshidome , Yukihisa Kawada
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2017-167319 20170831
- Main IPC: B01D37/04
- IPC: B01D37/04 ; B01J47/014 ; B01D27/00 ; B01D39/16 ; B01D53/46 ; B01J31/00 ; B01J31/06 ; B01D19/04

Abstract:
An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by purifying a substance to be purified containing an organic solvent, in which a content of the stabilizer in the substance to be purified with respect to the total mass of the substance to be purified is equal to or greater than 0.1 mass ppm and less than 100 mass ppm.
Public/Granted literature
- US11958005B2 Chemical liquid purification method and chemical liquid Public/Granted day:2024-04-16
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