Invention Application
- Patent Title: METHODS AND SYSTEMS FOR FILLING A GAP
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Application No.: US17953847Application Date: 2022-09-27
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Publication No.: US20230096838A1Publication Date: 2023-03-30
- Inventor: Jan Willem Maes , Elina Färm , Charles Dezelah , Shinya Iwashita
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/02 ; C23C16/455 ; C23C16/18
Abstract:
Disclosed are methods and systems for filling a gap. An exemplary method comprises providing a substrate to a reaction chamber. The substrate comprises the gap. The method comprises filling the gap with a metal-containing material.
Information query
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