Invention Application
- Patent Title: COIL SUBSTRATE FOR IMAGE STABILIZATION
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Application No.: US17906161Application Date: 2021-03-12
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Publication No.: US20230114245A1Publication Date: 2023-04-13
- Inventor: Sang Kyu LEE , Hyung Kyu YOON , Seung Jin LEE
- Applicant: LG INNOTEK CO., LTD.
- Applicant Address: KR Seoul
- Assignee: LG INNOTEK CO., LTD.
- Current Assignee: LG INNOTEK CO., LTD.
- Current Assignee Address: KR Seoul
- Priority: KR10-2020-0030771 20200312
- International Application: PCT/KR2021/003123 WO 20210312
- Main IPC: G03B5/04
- IPC: G03B5/04 ; H02K3/26 ; H02K41/035

Abstract:
A coil substrate according to an embodiment includes an insulating layer; a first coil pattern portion disposed on one surface of the insulating layer; a second coil pattern portion disposed on the other surface of the insulating layer; and a pad portion disposed on the one surface of the insulating layer and connected to the first coil pattern portion, wherein the first coil pattern portion includes: an inner coil pattern portion; and an outer coil pattern portion spaced apart from the inner coil pattern portion at a predetermined interval and disposed outside the inner coil pattern portion, wherein the pad portion is disposed between the inner coil pattern portion and the outer coil pattern portion.
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