Invention Application
- Patent Title: THREE-DIMENSIONAL INTEGRATED CIRCUIT STRUCTURE AND METHOD OF MANUFACTURING THE SAME
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Application No.: US17843594Application Date: 2022-06-17
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Publication No.: US20230131382A1Publication Date: 2023-04-27
- Inventor: Shaofeng DING , Jihyung KIM , Won Ji PARK , Jeong Hoon AHN , Jaehee OH , Yun Ki CHOI
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2021-0143894 20211026
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L25/07 ; H01L27/02

Abstract:
Disclosed is a three-dimensional integrated circuit structure including an active device die and a capacitor die stacked on the logic die. The active device die includes: a first substrate including a front side and a back side that are opposite to each other; a power delivery network on the back side of the first substrate; a device layer on the front side of the first substrate; a first wiring layer on the device layer; and a through contact that vertically extends from the power delivery network to the first wiring layer. The passive device die includes: a second substrate including a front side and a back side that are opposite to each other, the front side of the second substrate facing the front side of the first substrate; an interlayer dielectric layer on the front side of the second substrate, the interlayer dielectric layer including at least one hole; a passive device in the hole; and a second wiring layer on the passive device, wherein the second wiring layer faces and is connected to the first wiring layer.
Information query
IPC分类: