Invention Application
- Patent Title: USE OF EXISTING RRM MEASUREMENT GAP FOR PRS PROCESSING
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Application No.: US17452553Application Date: 2021-10-27
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Publication No.: US20230132286A1Publication Date: 2023-04-27
- Inventor: Mukesh KUMAR , Guttorm Ringstad OPSHAUG , Pulkit RAJGADIYA , Fnu SIDDHANT
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Main IPC: H04W64/00
- IPC: H04W64/00

Abstract:
A UE receives a first configuration for at least one RRM measurement gap. The UE receives one or more PRSs prior to the at least one RRM measurement gap. The UE identifies whether a processing availability of the UE during the at least one RRM measurement gap is sufficient to process the one or more PRSs. The UE processes the one or more PRSs, where in response to the processing availability of the UE during the at least one RRM measurement gap, the one or more PRSs are processed during the at least one RRM measurement gap; and in response to lack of the processing availability of the UE sufficient to process the one or more PRSs during the at least one RRM measurement gap, the one or more PRSs are processed, at least in part, outside of the at least one RRM measurement gap.
Public/Granted literature
- US11785571B2 Use of existing RRM measurement gap for PRS processing Public/Granted day:2023-10-10
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