Invention Application
- Patent Title: MRAM CELL EMBEDDED IN A METAL LAYER
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Application No.: US17513108Application Date: 2021-10-28
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Publication No.: US20230136650A1Publication Date: 2023-05-04
- Inventor: Ashim Dutta , Chih-Chao Yang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Main IPC: H01L43/02
- IPC: H01L43/02 ; H01L27/22 ; H01L43/12

Abstract:
Embodiments disclosed herein include a semiconductor structure. The semiconductor structure may include a magnetoresistive random access memory (MRAM) cell with a memory array landing pad contacting a first bottom metal level contact and an MRAM pillar electrically connected to the memory array landing pad. The semiconductor structure may also include a logic interconnect contacting a second bottom metal level contact and a dielectric cap above the MRAM cell and the logic interconnect. The MRAM cell and logic interconnect may be electrically connected to a top metal level through the dielectric cap.
Public/Granted literature
- US12058942B2 MRAM cell embedded in a metal layer Public/Granted day:2024-08-06
Information query
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