MRAM CELL EMBEDDED IN A METAL LAYER
Abstract:
Embodiments disclosed herein include a semiconductor structure. The semiconductor structure may include a magnetoresistive random access memory (MRAM) cell with a memory array landing pad contacting a first bottom metal level contact and an MRAM pillar electrically connected to the memory array landing pad. The semiconductor structure may also include a logic interconnect contacting a second bottom metal level contact and a dielectric cap above the MRAM cell and the logic interconnect. The MRAM cell and logic interconnect may be electrically connected to a top metal level through the dielectric cap.
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