Invention Application
- Patent Title: PVD Method and Apparatus
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Application No.: US17976798Application Date: 2022-10-29
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Publication No.: US20230136705A1Publication Date: 2023-05-04
- Inventor: Scott Haymore , Adrian Thomas , Tony Wilby , Stephen Burgess
- Applicant: SPTS Technologies Limited
- Applicant Address: GB Newport
- Assignee: SPTS Technologies Limited
- Current Assignee: SPTS Technologies Limited
- Current Assignee Address: GB Newport
- Priority: GB2115616.1 20211029
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/50

Abstract:
A substrate is positioned on a substrate supporting upper surface of a substrate support. An arrangement of permanent magnets is positioned beneath the substrate supporting upper surface so that permanent magnets are disposed underneath the substrate. The deposition material is deposited into the recesses formed in the substrate by sputtering a sputtering material from a target of a magnetron device. While depositing the deposition material, the arrangement of permanent magnets provides a substantially uniform lateral magnetic field across the surface of the substrate which extends into a region beyond a periphery of the substrate to enhance resputtering of deposited material deposited into the recesses.
Information query
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