Described examples include an integrated circuit having a transistor with a first gate on a first gate insulating layer. The transistor also has second gate separated from the first gate by a gate gap. The integrated circuit also includes a channel well at the gate gap extending under the first gate and the second gate. The transistor has a first source in the channel adjacent to an edge of the first gate. The transistor having a second source formed in the channel adjacent to an edge of the second gate separated from the first source by a channel gap. The transistor has at least one back-gate contact, the at least one back-gate contact separated from the first gate by a first back-gate contact gap and separated from the second gate by a second back-gate contact gap.