Invention Publication
- Patent Title: METHOD AND SYSTEM TO MONITOR A PROCESS APPARATUS
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Application No.: US18233263Application Date: 2023-08-11
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Publication No.: US20240004299A1Publication Date: 2024-01-04
- Inventor: Wim Tjibbo TEL , Mark John MASLOW , Frank STAALS , Paul Christiaan HINNEN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP 187040.7 2016.09.02
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/00

Abstract:
A method involving determining a contribution that one or more process apparatuses make to a characteristic of a substrate after the substrate has been processed according to a patterning process by the one or more process apparatuses by removing from values of the characteristic of the substrate a contribution of a lithography apparatus to the characteristic and a contribution of one or more pre-lithography process apparatuses to the characteristic.
Information query
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