Invention Publication
- Patent Title: SUBSTRATE BONDING SYSTEM AND METHOD FOR SUBSTRATE BONDING
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Application No.: US18257674Application Date: 2021-12-13
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Publication No.: US20240014153A1Publication Date: 2024-01-11
- Inventor: Takashi FUJIBAYASHI , Kenji OUCHI
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP 20217832 2020.12.25
- International Application: PCT/JP2021/045796 2021.12.13
- Date entered country: 2023-06-15
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
A substrate bonding system in one manner of the present disclosure includes a surface treatment module configured to perform plasma processing on a surface of a substrate. The substrate bonding system includes a deposition module coupled to the surface treatment module such that the substrate is transferred to the deposition module without being exposed to atmosphere, the deposition module being configured to perform a deposition process on the substrate on which the plasma processing is performed in the surface treatment module. The substrate bonding system includes a bonding module coupled to the deposition module such that the substrate is transferred to the bonding module without exposing the substrate to the atmosphere, the bonding module being configured to bond substrates on which the deposition process is performed in the deposition module, to form a bonded body.
Information query
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