A method for manufacturing an image display device according to an embodiment includes: preparing a first substrate, the first substrate including a circuit element, a first wiring layer connected to the circuit element, and a first insulating film covering the circuit element and the first wiring layer; forming a conductive layer including a single-crystal metal on the first insulating film; forming a semiconductor layer including a light-emitting layer on the single-crystal metal; forming a light-emitting element including a light-emitting surface by patterning the semiconductor layer; forming a second insulating film covering the first insulating film, the conductive layer, and the light-emitting element; forming a first via extending through the first and second insulating films; forming a second wiring layer on the second insulating film; and removing at least a portion of the conductive layer on the light-emitting surface.