Invention Publication
- Patent Title: POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION
-
Application No.: US18068365Application Date: 2022-12-19
-
Publication No.: US20240043592A1Publication Date: 2024-02-08
- Inventor: Minsang KIM , Haengdeog KOH , Yoonhyun KWAK , Chanjae AHN , Jungha CHAE , Sungwon CHOI , Minyoung HA
- Applicant: Samsung Electronics Co., Ltd.,
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.,
- Current Assignee: Samsung Electronics Co., Ltd.,
- Current Assignee Address: KR Suwon-si
- Priority: KR 20220090610 2022.07.21
- Main IPC: C08F220/18
- IPC: C08F220/18 ; C07C381/12 ; G03F7/039 ; G03F7/038 ; C08F212/14
Abstract:
Provided are a polymer including a repeating unit represented by Formula 1, a photoresist composition including the polymer, and a method of forming a pattern by using the photoresist composition:
wherein the details of R11, L11, a11, A11−, and B11+in Formula 1 are provided in the present specification.
wherein the details of R11, L11, a11, A11−, and B11+in Formula 1 are provided in the present specification.
Information query
IPC分类:
