- 专利标题: METHODS OF INSPECTING SAMPLES WITH A BEAM OF CHARGED PARTICLES
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申请号: US18484161申请日: 2023-10-10
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公开(公告)号: US20240044820A1公开(公告)日: 2024-02-08
- 发明人: Kuo-Feng TSENG , Zhonghua DONG , Yixiang WANG , Zhong-wei CHEN
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G01N23/2206
- IPC分类号: G01N23/2206 ; G01N23/2251 ; G01N23/203
摘要:
Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.
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