An optical proximity correction (OPC) method using a Jacobian matrix, which may minimize an edge placement error (EPE) of an arbitrary pattern, and a method of manufacturing a mask by using the OPC method. The OPC method may include obtaining training data for calculating a differentiation Jacobian matrix of a mask segment of an EPE, obtaining a neural Jacobian matrix model through artificial neural network (ANN) training using the training data, and applying a prediction value based on the neural Jacobian matrix model to mask optimization (MO) to minimize the EPE.