公开(公告)号：US20240045321A1

公开(公告)日：2024-02-08

申请号：US18131436

申请日：2023-04-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Moojoon Shin ,  Sooyong Lee

IPC: G03F1/36 ,  G03F7/00 ,  G03F1/44

CPC classification number: G03F1/36 ,  G03F7/70425 ,  G03F1/44 ,  G03F7/705

Abstract: An optical proximity correction (OPC) method using a Jacobian matrix, which may minimize an edge placement error (EPE) of an arbitrary pattern, and a method of manufacturing a mask by using the OPC method. The OPC method may include obtaining training data for calculating a differentiation Jacobian matrix of a mask segment of an EPE, obtaining a neural Jacobian matrix model through artificial neural network (ANN) training using the training data, and applying a prediction value based on the neural Jacobian matrix model to mask optimization (MO) to minimize the EPE.